Physical vapor deposition (PVD) defines a class of vacuum-based deposition techniques that deposit coatings and thin films onto the surface of a part by evaporating or sputtering a solid source material. Southwest Research Institute provides research and development services to advance physical vapor deposition technologies, including:
- Magnetron Sputtering
- Plasma Enhanced Magnetron Sputtering (PEMS)
- High Power Impulse Magnetron Sputtering (HiPIMS)
- Cylindrical Magnetron Sputtering
- Reactive Magnetron Sputtering
- Electron Beam Evaporation
- Roll to Roll Thermal Evaporation
- Ion Beam Assisted Deposition
PVD Deposition & Coating Services
SwRI’s materials science laboratory offers 20 vacuum chambers for depositing thin films on solid surfaces.
PVD coatings can be deposited onto a variety of materials using several methodologies. SwRI provides PVD deposition and coating services for several industries using the following methods and applications, among others:
- Diamond Like Carbon (DLC)
- Titanium Silicon Carbon Nitride Nanocomposite (TiSiCN)
- Titan-X Coating Series 3100, 4100, 5100
- Titanium Nitride (TiN)
- Chromium Nitride (CrN)
- Aluminum Chromium Nitride (AlCrN / CrAlN)
- Tantalum (Ta)
- Hastelloy C-276
- Yttrium Stabilized Zirconia (YSZ)
- Zirconium Nitride (ZrN)
- Oxide film
- Titanium oxide (TiO2)
- Optical Coatings & Thin films
- Dichroic thin films
- Anti-reflective coatings
- Moth-eye coatings
- Flexible thin films
- Roll to roll coatings